The research of far-field diffraction and optical limiting in hot atomic vapor

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Important Dates

Conference:

Aug. 18-20, 2018

Full Paper Due: Jul. 20, 2018

Abstract Due: Jul. 20, 2018

Audience Registration Due:
Aug. 18, 2018

Presentations of The Int'l Symposium on Photonics and Optoelectronics (SOPO 2016)

● The research of far-field diffraction and optical limiting in hot atomic vapor
Author(s)
qian zhang
Affiliation(s)
Institute of Photonics &Photon-Technology, Northwest University, Xi’an , China
KEYWORDS
far-field diffraction, optical limiting, hot atomic vapor
ABSTRACT
In this work, we characterize the far-field diffraction ring patterns in hot atomic vapor cell ( ) by setting the sample cell at various sample positions. The results indicated that bright central spots would appear using a diverging beam and a dark spot would appear using a convergent beam. An exception for a convergent beam happened if the sample cell was set close to the focus point, this phenomenon was well explained by the Kerr effect together with the thermally induced optical nonlinearity and simulated by Fresnel-Kirchhoff diffraction integral formula. In addition, we found the optimal position of the sample cell where the lowest limiting threshold and clamp output are the lowest in the optical limiting.